产品描述
Grish provide polishing products for LED & Semiconductor polishing. We offer both wet and dry polishing suspensions, as well as oil-based and water-based formulations. Our professional Semiconductor material experts are with more than 20 years experiences. We’re honored to help you get the ideal finish that you need. Application of our Monocrystalline Diamond Slurry in Semiconductor Materials, such as Silicon Carbide Substrate and InP/GaAs Material. GaAs and InP are foundational material for Microelectronics & Photoelectron application, InP as second general of typical Semiconductor material features high light and electron conversion efficiency, great electron mobility, high working temperature and better anti-radiation property, widely applied in optical communication, high frequency MMW, solar energy battery for outer space, etc. 5G network property high frequency & High transmitting speed will need better working performance for RF module, in which InP material will play a critical role. The signal receiver and amplifier made from InP material is able to work on the frequency above 1000GHz with wide broadband and perfect working stability. Therefore, in 5G era, InP will be a major material for RF module of terminal device and base transceiver station, and the market is booming up. GRISH Nano Diamond Slurry (DND Slurry) Semiconductor Polishing Slurry Take a Closer Look Excellent Finish The workpiece will be flat and smooth, without obvious defects. Higher Removal Rate The micro powder has special morphology and chemical mechanical polishing effect to get a fast removal rate. A high quality of water-soluble high-efficient lapping agent, which can effectively cool, lubricate, improve the grinding effect and protect the workpieces during the process of double-side grinding used with B4C together. An eco-friendly Liquid Wax with good fluidity GRISH Dewax Liquid is an anti-static cleaner that removes every layer of wax from the surface. GRISH Polishing Pad has excellent micro-cellular structure which provide good polishing stability, abrasion resistance and keeping polishing liquid retention well during polishing.
